Independent-Exposure Method in Electron-Beam Lithography | IntechOpen
A comparative study of resists and lithographic tools using the Lumped Parameter Model
9. How are photo resists exposed, and how can the optimum exposure dose be determined? How long can coated and exposed substrates be stored prior to exposure? - Allresist EN
A comprehensive nano-interpenetrating semiconducting photoresist toward all- photolithography organic electronics | Science Advances
a) The relation of exposure dose and spot width (exposure: 1.5, 1.4... | Download Scientific Diagram
Pronounced-undercut-with-increasing-exposure-dose - Allresist EN
Dose performance characterization of extreme ultraviolet exposure system using enhanced energy sensitivity by resist contrast method: Journal of Vacuum Science & Technology B: Vol 34, No 4
Proximity Effect Correction | Electron Dose
Grayscale e-beam lithography: Effects of a delayed development for well-controlled 3D patterning - ScienceDirect
Simulation result of dose modulation. With decreasing exposure dose,... | Download Scientific Diagram
ED tree for an exposure condition: (a) decision for nominal dose E 0... | Download Scientific Diagram
Photolithography
Willson Research Group - Research - Double Exposure Lithography
Exposure of Photoresists
Influence of exposure dose on achievable channel width for different... | Download Scientific Diagram
Lithography
a). Average develop ment rates versus exposure dose for ascending... | Download Scientific Diagram
Chris A. Mack, Fundamental Principles of Optical Lithography, (c) ppt video online download
1a:Thickness-dose characteristic of standard i-line photoresist (film... | Download Scientific Diagram
Quantitative analysis and modeling of line edge roughness in near-field lithography: toward high pattern quality in nanofabrication
Quantitative analysis and modeling of line edge roughness in near-field lithography: toward high pattern quality in nanofabrication
Understanding dose correction for high-resolution 50 kV electron-beam lithography on thick resist layers - ScienceDirect
Lithography
Spatial modulation of nanopattern dimensions | EurekAlert!
20: (SEM micrographs) Conventional order hybrid lithography result... | Download Scientific Diagram
2.6.1 Contrast and Important Properties
